NexWafe, a Freiburg, Germany-based spin-off from the Fraunhofer Institute for Solar Energy Systems ISE, launched with seed funding from Fraunhofer Venture.
The amount of the deal was not disclosed.
Led by Founder and CEO Stefan Reber, and Frank CFO and co-founder Siebke, PhD, NexWafe will transfer Fraunhofer ISE’s kerfless wafer technology into production. Being based on epitaxy, the kerfless wafer, which has been developed throughout the last fifteen years, is a drop-in replacement for conventional wafers produced by a single-crystal ingot and wire sawing process.
Reber and his team of 30 people have developed a reliable epitaxial deposition process for crystalline silicon layers, which is transferable to the photovoltaic industry. The process focus is on atmospheric pressure chemical vapor deposition (APCVD) at temperatures up to 1300 degrees C.