IMS Nanofabrication to Receive Equity Funding

IMS Nanofabrication AG, a Vienna, Austria-based developer of nanometer scale mask and direct write lithography imaging technology for semiconductor manufacturing applications, has signed an equity funding agreement of undisclosed amount with Intel Capital, Photronics Inc. and other private investor groups.

The transaction is still subject to satisfaction of customary closing conditions with closing expected to occur by the end of 2011.

The company intends to use the funding to continue to develop and commercialize its electron multi-beam mask exposure tool (eMET) for sub 22nm mask writing applications.

Led by CEO Max Bayerl IMS Nanofabrication was founded in December 2006 through the merger of the former IMS Nanofabrication GmbH and IMS – Ionen Mikrofabrikations Systeme GmbH.



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